Work

Contact hole metrology study: understand the electron beam interaction with photoresist and how to minimize its impact

Year: 2025

Type: article

Source: Journal of Micro/Nanopatterning Materials and Metrology

DOI: 10.1117/1.jmm.24.2.024004

Authors: Mohamed Zidan, Gian Francesco Lorusso, Danilo De Simone, Mohamed Saib, Alain Moussa, Hans Billington, Roberto Fallica, Anne-Laure Charley, Stefan De Gendt

Institutions: KU Leuven, IMEC

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4411401642

FWCI:

Cites: 13

Cited by:

Related to: 10