Work

Infinite selectivity in dry etching process for high-aspect-ratio hole using C7HF7 gas plasma

Year: 2025

Type: article

Source: Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

DOI: 10.1116/6.0004582

Authors: Junji Kataoka, Norikatsu Sasao, Koji Asakawa, Shuichi Kuboi, Daiki Iino, Kazuaki Kurihara, Hiroyuki Fukumizu

Institution: KIOXIA Corporation (Japan)

Language: English

Topic: Plasma Diagnostics and Applications

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4411423446

FWCI: 0.462

Cites: 26

Cited by: 2

Related to: 10