Work

Preparation and Characterization of Excellent Performance Photosensitive Resin Suitable for Photocuring 3D Printing

Year: 2025

Type: article

Source: Journal of Polymer Science

DOI: 10.1002/pol.20250409

Authors: Haiwei Ma, Xianzhe Li, Xin Ding, Chunlei Cao, Jianying Ma

Institution: Changchun University of Technology

Language: English

Topic: Photopolymerization techniques and applications

Subfield: Organic Chemistry

Field: Chemistry

Domain: Physical Sciences

SDGs: Responsible consumption and production, Industry, innovation and infrastructure

Open Access status: closed

OpenAlex ID: W4411498965

FWCI: 2.384

Cites: 45

Cited by: 8

Related to: 10