Work

Advanced UV Laser Lithography Using a Tiltable Platform for 3D Microfabrication

Year: 2025

Type: conference-paper

Source: IEEE Dallas Circuits and Systems Conference (DCAS)

DOI: 10.1109/dcas65331.2025.11045479

Authors: Adam Malmquist, Jun Ying Tan, Jungkwun JK Kim

Institution: University of North Texas

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4411640493

FWCI:

Cites: 11

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Related to: 10