Direct Evidence of Oxygen Vacancy Generation in Whole Gate Stacks Through Multiple Electrical and Atomic-Scale Physical Methods as the Cause of Endurance Failure in FeFETs
Year: 2025
Type: conference-paper
Institution: Chinese Academy of Sciences
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W4411799123
