Work

Enhanced NBTI Characteristics in HfO2/TiAlC RMG Stacks via Low-Temperature H* Remote Plasma Treatment After Interfacial Layer Growth

Year: 2025

Type: conference-paper

Source: IEEE Electron Devices Technology & Manufacturing Conference (EDTM)

DOI: 10.1109/edtm61175.2025.11040255

Authors: Songyi Jiang, Qianqian Liu, Hong Yang, Mingyang Sun, Junjie Li, Jianfeng Gao, Shuai Yang, Runsheng Wang, Jun Luo, Wenwu Wang

Institutions: Chinese Academy of Sciences, Peking University

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: National Science Foundation

Award: G2119559542

OpenAlex ID: W4411799135

FWCI:

Cites: 7

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Related to: 10