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An Atomic Layer Etching Technique for MOCVD in-Situ SiNx

Year: 2025

Type: conference-paper

Source: IEEE Electron Devices Technology & Manufacturing Conference (EDTM)

DOI: 10.1109/edtm61175.2025.11040653

Authors: Fangzhou Du, Yang Jiang, Ziyang Wang, Xinyi Tang, Qing Wang, Hongyu Yu

Institution: Southern University of Science and Technology

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4411799213

FWCI:

Cites: 7

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Related to: 10