Work

Nickel Pyrrolide Complexes as Precursors for the Chemical Vapor Deposition of Metallic Thin Films of Nickel

Year: 2025

Type: article

Abstract: High Resolution Image Download MS PowerPoint Slide We report here the synthesis of a novel class of precursors for the chemical vapor deposition (CVD) of thin films of metallic, face-centered cubic (fcc) nickel. The complexes are simple and inexpensive to synthesize, possess high volatility (vapor pressure = 0.1 Torr at 40 °C), and enable rapid deposition rates of nickel under CVD conditions (up to 6.5 nm/min at 250 °C). We show that the deposited nickel films have high elemental purity (>99 at%), resistivity comparable to bulk nickel (7–23 μΩ·cm cf . 6.93 μΩ·cm), exhibit shallow surface features ( ca . ± 10 nm), and very low surface roughness (RMS = 2.72 nm). These data compare favorably with those of the current state-of-the-art metallic nickel CVD precursors.

Source: Inorganic Chemistry

DOI: 10.1021/acs.inorgchem.5c01934

Authors: Thomas Pugh, Joe C. Goodall, Kieran C. Molloy, Andrew L. Johnson

Institution: University of Bath

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: hybrid

Estimated APC paid: $4,500

Funder: University of Bath