Work

Optimization and mechanism investigation of pulse etching modes for aluminum line patterning in CMOS image sensor chip manufacturing

Year: 2025

Type: article

Source: Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena

DOI: 10.1116/6.0004515

Authors: Jiacheng Wang, Yongkang Cao, Zhaoyang Chen, Dongchen Che, Xiangyu Wang, Kaidong Xu, Shiwei Zhuang

Institution: Jiangsu Normal University

Language: English

Topic: Plasma Diagnostics and Applications

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funders: Ministry of Science and Technology of the People's Republic of China, Jiangsu Normal University

OpenAlex ID: W4411929239

FWCI: 0.46

Cites: 32

Cited by: 2

Related to: 10