Removal of high-voltage-induced surface charges by ultraviolet light
Year: 2025
Type: article
Abstract: A plethora of studies ranging from precision physics to quantum information employ ions, highly excited neutral atoms, or polar molecules as tools. Motivated by the need for miniaturization, scalability, and controllability, the particles are often trapped close to electrodes imprinted on dielectric surfaces. However, such geometry makes the particles susceptible to undesired surface charges. To understand how high voltage applied to the electrodes mediates the buildup of charges, we use a scanning Kelvin probe in an ultrahigh vacuum to investigate the electric potential landscape of an electrostatic molecule trap with a microstructured electrode array. We find that the surface becomes positively charged after applying voltages to the electrodes, leading to offset and patch electric potentials across the surface. Removal of these charges is demonstrated using ultraviolet light. The dynamics of this process, including the dependence on light intensity, wavelength, and sample type, are investigated in detail. We find the charge removal to be faster for shorter ultraviolet wavelengths, with an additional polymer coating providing further enhancement. Our findings may be useful in a wide spectrum of experiments with electric-field-sensitive particles.
Source: Review of Scientific Instruments
DOI: 10.1063/5.0269038
Authors: M. T. Ziemba, J. Phrompao, F. Jung, I. M. Rabey, G. Rempe
Institution: Max Planck Institute of Quantum Optics
Language: English
Subfield: Physical and Theoretical Chemistry
Field: Chemistry
Domain: Physical Sciences
Open Access status: hybrid
Funders: Institute for the Promotion of Teaching Science and Technology, International Max Planck Research School for Environmental, Cellular and Molecular Microbiology, Deutsche Forschungsgemeinschaft, International Max Planck Research School for Advanced Methods in Process and Systems Engineering, International Max Planck Research School for Quantum Science and Technology
OpenAlex ID: W4411978935
