Work

Two-Step Photoelectron Lithography for Working with Fragile Nanostructures

Year: 2025

Type: article

Source: Instruments and Experimental Techniques

DOI: 10.1134/s0020441225700393

Authors: S. G. Martanov, E. V. Tarkaeva, V. A. Ievleva, A. U. Kuntsevich

Institutions: P.N. Lebedev Physical Institute of the Russian Academy of Sciences, Russian Academy of Sciences, National Research University Higher School of Economics

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4412032947

FWCI:

Cites: 6

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Related to: 10