Work

Direct Current and Radio Frequency Plasma Sources for Co-Sputtering of All-Solid-State Electrochromic Devices

Year: 2025
Type: conference-paper
Authors: Yu-Wei Chang, Hsi-Chao Chen, Hong-Jie Lin, Ri-Jun Li, Yi-Jie Jiang, Shih-Hao Shao, Po-Hung Li
Language: English
Open Access status: closed
OpenAlex ID: W4412566751
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Cites: 5
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Related to: 10