Direct Current and Radio Frequency Plasma Sources for Co-Sputtering of All-Solid-State Electrochromic Devices
Year: 2025
Type: conference-paper
Authors: Yu-Wei Chang, Hsi-Chao Chen, Hong-Jie Lin, Ri-Jun Li, Yi-Jie Jiang, Shih-Hao Shao, Po-Hung Li
Institution: National Yunlin University of Science and Technology
Language: English
Subfield: Polymers and Plastics
Field: Materials Science
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W4412566751
