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Optical and Durability Properties of Microwave Plasma Assisted Sputter Deposited Stoichiometric Silicon Nitride

Year: 2025

Type: conference-paper

Abstract: A study of the optical and mechanical properties of stoichiometric Silicon Nitride deposited using microwave plasma assisted sputtering. A coating stress of -317MPa, hardness of 1.3GPa was obtained with a transmittance range of 300nm-5μm.

DOI: 10.1364/oic.2025.tb.8

Authors: Connor Lindsay, Carlos Garcia Nuñez, Lewis Fleming, Ian Brinkley, Stuart Reid, Iain Martin, Des Gibson

Institutions: University of the West of Scotland, University of Glasgow, University of Strathclyde

Language: English

Topic: Metal and Thin Film Mechanics

Subfield: Mechanics of Materials

Field: Engineering

Domain: Physical Sciences

Open Access status: green

Funders: University of Glasgow, University of the West of Scotland, Science and Technology Facilities Council

Award: Investigations in gravitational radiation

OpenAlex ID: W4412566846

FWCI:

Cites: 10

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Related to: 10