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Ferroelectric recovery of scaled-down Y-doped HfO 2 thin films on NiSi 2 after annealing

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Year: 2025
Type: article
Source: Nanoscale
DOI: 10.1039/d5nr01237f
Author: Joel Molina-Reyes
Institutions: National Institute of Astrophysics, Optics and Electronics, Institute of Science Tokyo
Language: English

Topic: Ferroelectric and Negative Capacitance Devices
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences

Open Access status: closed

Funders: Consejo Nacional de Ciencia y Tecnología, Japan Society for the Promotion of Science, Center of Innovation Program
Award: Investigation of ferroelectric character in Wurtzite ferroelectrics using epitaxial films
OpenAlex ID: W4412641679
FWCI: 0.462
Cites: 20
Cited by: 2
Related to: 10
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