Ferroelectric recovery of scaled-down Y-doped HfO 2 thin films on NiSi 2 after annealing
Year: 2025
Type: article
Source: Nanoscale
DOI: 10.1039/d5nr01237f
Author: Joel Molina-Reyes
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W4412641679
