Work

BEOL-Compatible Annealing Effects on Properties of ALD NbOX Films

Year: 2025

Type: conference-paper

Source: Silicon Nanoelectronics Workshop (SNW)

DOI: 10.23919/snw65111.2025.11097258

Authors: Gaoqi Yang, Ruiqing Xie, Linbo Shan, Jiye Li, Lin Bao, Zongwei Wang, Yimao Cai

Institution: Peking University

Language: English

Topic: Advanced Memory and Neural Computing

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4412803405

FWCI: 2.358

Cites: 5

Cited by: 1

Related to: 10