Work

All-in-One Monolithic 3D Heterostructured Integration of BEOL-Complementary N-Si FinFET / P-CNFET for Smart Edge Processing

Year: 2025

Type: conference-paper

Source: Silicon Nanoelectronics Workshop (SNW)

DOI: 10.23919/snw65111.2025.11097236

Authors: Shuang Liu, Feixiong Wang, Heyi Huang, Yadong Zhang, Yanqing Li, Yanzhao Wei, Huaxiang Yin

Institutions: Chinese Academy of Sciences, Institute of Microelectronics

Language: English

Topic: Advancements in Semiconductor Devices and Circuit Design

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4412803432

FWCI:

Cites: 1

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Related to: 10