Work

Investigation on Enhanced Hot Carrier Degradation in FinFETs at Cryogenic Temperature

Year: 2025

Type: conference-paper

Source: Silicon Nanoelectronics Workshop (SNW)

DOI: 10.23919/snw65111.2025.11097247

Authors: Zirui Wang, Zuoyuan Dong, Hongbo Wang, Zixuan Sun, Yue-Yang Liu, Xing Wu, Runsheng Wang

Institutions: Peking University, Chinese Academy of Sciences, Institute of Semiconductors, East China Normal University

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4412803499

FWCI:

Cites:

Cited by:

Related to: 10