Work

Vertical Channel Transistor-Based OS-Si Hybrid Gain Cell for High-Density and High-Retention Embedded DRAM

Year: 2025

Type: conference-paper

Source: Silicon Nanoelectronics Workshop (SNW)

DOI: 10.23919/snw65111.2025.11097232

Authors: Yu-Hsuan Chuang, Vita Pi-Ho Hu

Language: English

Topic: Advancements in Semiconductor Devices and Circuit Design

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

SDG: Industry, innovation and infrastructure

Open Access status: closed

OpenAlex ID: W4412803513

FWCI:

Cites: 2

Cited by:

Related to: 10