Work

Thermally Stable Vertical-Stacked 1T1C FeRAM with Record 3.3 μF/cm2 CMW Based on Unified Ferroelectric-Oxide Semiconductor Stack

Year: 2025

Type: conference-paper

Source: Silicon Nanoelectronics Workshop (SNW)

DOI: 10.23919/snw65111.2025.11097238

Authors: Xujin Song, Dijiang Sun, Jiajia Zhang, Chenxi Yu, Xiaoyan Liu, Jinfeng Kang

Institution: Peking University

Language: English

Topic: Ferroelectric and Negative Capacitance Devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4412803606

FWCI: 2.277

Cites:

Cited by: 1

Related to: 10