Work

Composition-controllable growth of GeTe x thin films via combined atomic layer deposition and chemical vapor deposition

Year: 2025

Type: article

Source: Journal of Materials Chemistry C

DOI: 10.1039/d5tc02138c

Authors: Min Gyoo Cho, Sehwan Jeon, Hyun Wook Kim, Ju Hwan Park, Taeyong Eom, Byung Joon Choi

Institutions: Seoul National University of Science and Technology, Sejong University

Language: English

Topic: Phase-change materials and chalcogenides

Subfield: Materials Chemistry

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

Funders: Ministry of Trade, Industry and Energy, National Research Foundation of Korea, Ministry of Science and ICT, South Korea

Awards: G1326453366, G2044504497, G6903214941, G7215335097

OpenAlex ID: W4412865158

FWCI: 0.831

Cites: 42

Cited by: 4

Related to: 10