Review of the effect and progress in uniform films prepared by the magnetron sputtering method
Year: 2025
Type: article
Source: CrystEngComm
DOI: 10.1039/d5ce00515a
Authors: Xinhang Wang, Aobo Wang, Jun Gao, Zhengwang Cheng, Mei Wang, Baozhang Zhao, Wei Zou, Xinguo Ma
Institution: Hubei University of Technology
Language: English
Subfield: Mechanics of Materials
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
Awards: G1985937236, G6871147469, G8850311661
OpenAlex ID: W4412902912