Work

Wafer-Scale Monolithic 3D Integration of CMOS Logic Gates Based on 2D Materials

Year: 2025

Type: conference-paper

DOI: 10.23919/vlsitechnologyandcir65189.2025.11074931

Authors: Luhing Hu, Jaewoo Shim, Joonyun Kim, Hyeong-Seok Jang, Baekwon Park, Sang Won Kim

Institution: Samsung Advanced Institute of Technology (South Korea)

Language: English

Topic: 2D Materials and Applications

Subfield: Materials Chemistry

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4412962837

FWCI: 20.17

Cites: 10

Cited by: 4

Related to: 10