Work

High Density 7nm FinFET Dielectric RRAM in Embedded Memory Applications

Year: 2025

Type: conference-paper

DOI: 10.23919/vlsitechnologyandcir65189.2025.11075153

Authors: Pin-Hsuan Shih, Wei-Hwa Lin, Yue-Der Chih, Eric Wang, Jonathan Chang, Ya-Chin King, Chrong Jung Lin

Institutions: National Tsing Hua University, Taiwan Semiconductor Manufacturing Company (Taiwan)

Language: English

Topic: Advanced Memory and Neural Computing

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: Taiwan Semiconductor Manufacturing Company

OpenAlex ID: W4412963796

FWCI: 4.601

Cites:

Cited by: 2

Related to: 10