First Demonstration of Fluorine-Treated IGZO FETs with Record-Low Positive Bias Temperature Instability $\left(\left\vert \Delta V_{\text{TH}}\right\vert<44 \text{mV}\right)$ at an Elevated Temperature (395 K)
Year: 2025
Type: conference-paper
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W4412964788
