Record PMOS WSe2 GAA Performance Using Contact Planarization, and Systematic Exploration of Manufacturable, High-Yield Contacts
Year: 2025
Type: conference-paper
Authors: M. Jaikissoon, P. Buragohain, W. Mortelmans, K. Oguz, C. Rogan, J. Lux, A. Kitamura, C. Engel, R.F. Vreeland, H. Barnett, Z. Brooks, S. Harlson, S.S.K. Pinnepalli, E. Gillispie, K. Toku, T. Wilson, A. Oni, A. V. Penumatcha, C.J. Dorow, M. Kavrik, A. Kozhakhmetov, K. Maxey, N. Arefin, J. Kevek, T. Tronic, M. Metz, S.B. Clendenning, K.P. O'Brien, U. Avci
Institution: Intel (United States)
Language: English
Subfield: Materials Chemistry
Field: Materials Science
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W4412965383