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Monolithic CFET Flow Improvements Integrating Cover Spacer and Dual-WF RMG

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Year: 2025
Type: conference-paper
DOI: 10.23919/vlsitechnologyandcir65189.2025.11075156
Authors: C. Cavalcante, S. Demuynck, C. Sheng, D. Batuk, M. Hosseini, A. Peng, K. Stiers, A. Vandooren, H. Mertens, T. Chiarella, H. Arimura, J. Mitard, V. Georgieva, H. Puliyalil, A. Sepulveda Marquez, M. Chistiakova, A. Peter, Y. Kimura, F. Sebaai, P. Puttarame Gowda, J. G. Lai, A. Arslanova, N. Reddy, A. Mingardi, S. Kumar Sarkar, R. Kumar Saroj, S. Choudhury, D. Alvarez, T. Sarkar, I. Gyo Koo, E. Altamirano Sanchez, S. Subramanian, L. P. B. Lima, N. Horiguchi, S. Biesemans
Institution: IMEC
Language: English

Topic: Advancements in Semiconductor Devices and Circuit Design
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
SDG: Industry, innovation and infrastructure

Open Access status: closed
OpenAlex ID: W4412965662
FWCI: 16.24
Cites: 1
Cited by: 7
Related to: 10
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