Work

Effects of Adjacent Floating Metal Interconnect Through Plasma-Induced Coupling

Year: 2025

Type: conference-paper

DOI: 10.23919/vlsitechnologyandcir65189.2025.11075060

Authors: Sohyeon Lee, Se Hoon Lee, Howon Choi, Byoungwook Woo, Dong-Kyu Kim, Jeongmin Lee, Yun Jin Heo, Eunhye Kim, Sejun Park, Seungwan Hong, Sunghoi Hur

Institutions: Samsung (South Korea), Samsung Electronics (South Korea)

Language: English

Topic: Copper Interconnects and Reliability

Subfield: Electronic, Optical and Magnetic Materials

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4412966046

FWCI:

Cites: 6

Cited by:

Related to: 10