First Demonstration of BEOL-Compatible ALD-Deposited 2 nm-Thick Indium-Tungsten-Tin-Oxide (IWTO) TFTs with Superior Short-Channel Electrical Characteristics: Achieving Enhancement-Mode $\mathrm{V}_{\text{TH }}, \mathrm{I}_{\text{ON } / \text{OFF }}>10^{{10}}$, SS ~ 63.3 mV/dec
Year: 2025
Type: conference-paper
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
Award: G8637225341
OpenAlex ID: W4412966052
