Work

Impact of the Inter-Fin Space on Stress Modulation and FinFET Transistor Performance

Year: 2025

Type: conference-paper

Source: International Conference on IC Design and Technology

DOI: 10.1109/icicdt65192.2025.11078040

Authors: Angelo Rossoni, Tomasz Brozek, Sharad Saxena, Rajesh Khamankar, Zsolt M. Kovacs-Vajna

Institutions: University of Brescia, PDF Solutions (United States)

Language: English

Topic: Advancements in Semiconductor Devices and Circuit Design

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4412972237

FWCI:

Cites: 5

Cited by:

Related to: 10