Work

Spectroscopy and Actinometry of Halogen-Containing Inductively Coupled Plasma for Anisotropic Etching

Year: 2025

Type: article

Source: Russian Microelectronics

DOI: 10.1134/s106373972560013x

Author: V. O. Kuzmenko

Institution: Kurchatov Institute

Language: English

Topic: Plasma Diagnostics and Applications

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4413022972

FWCI:

Cites: 16

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Related to: 10