Work

Electrical Characteristics of Ruthenium Tracks with a Cross-Sectional Area Less Than 1000 nm2

Year: 2025

Type: article

Source: Russian Microelectronics

DOI: 10.1134/s1063739725600086

Authors: O. G. Glaz, A. E. Rogozhin

Institutions: Moscow Power Engineering Institute, Kurchatov Institute

Language: English

Topic: Copper Interconnects and Reliability

Subfield: Electronic, Optical and Magnetic Materials

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4413023013

FWCI: 0.163

Cites: 8

Cited by: 1

Related to: 10