Work

Optimization of N/P Performance Matching through Adjusting Extension Region Doping Concentration for Vertical Gate-All-Around FETs

Year: 2025

Type: conference-paper

Source: International Symposium of Electronics Design Automation (ISEDA)

DOI: 10.1109/iseda65950.2025.11101191

Authors: Xinlong Guo, Tao Liu, Ziqiang Huang, Lewen Qian, Meicheng Liao, Min Xu, David Wei Zhang

Institution: Fudan University

Language: English

Topic: Advancements in Semiconductor Devices and Circuit Design

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4413122655

FWCI: 2.358

Cites: 17

Cited by: 1

Related to: 10