Work

Sub-nanometer ZrO2 capping Hf0.5Zr0.5O2 thin films for BEOL-compatible ferroelectric tunnel junction with giant electroresistance

Year: 2025

Type: article

Source: Applied Physics Letters

DOI: 10.1063/5.0284014

Authors: Jingchao Xiao, Yating Cao, Wei Zhang, Yubao Li

Institution: Hebei University

Language: English

Topic: Ferroelectric and Negative Capacitance Devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funders: National Natural Science Foundation of China, Hebei University

Awards: G2324625789, G8380846798

OpenAlex ID: W4413192998

FWCI: 0.924

Cites: 35

Cited by: 4

Related to: 10