Work

Performance Analysis of Gate All Around Nanowire- FET in Subthreshold Region on 14nm Channel Length

Year: 2025

Type: conference-paper

DOI: 10.1109/icetea64585.2025.11099641

Authors: Aravinda Krishnan V.S., Gokul S, Vuddagiri Kaushal Sri Surya, Kuleen Kumar

Institution: National Institute of Technology, Puducherry

Language: English

Topic: Advancements in Semiconductor Devices and Circuit Design

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4413204869

FWCI: 2.358

Cites: 13

Cited by: 1

Related to: 10