Buried-Gate Flexible CNT FET with HZO Dielectric on Mica Substrate
Year: 2025
Type: article
Abstract: Carbon nanotube field-effect transistors (CNT FETs) are considered strong candidates for next-generation flexible electronics due to their excellent carrier mobility and mechanical flexibility. However, the fabrication of CNT FETs on conventional flexible substrates such as PI or PET is often limited by surface roughness, chemical incompatibility, and poor mechanical robustness, resulting in degraded device performance. In this study, we report the fabrication of buried-gate CNT FETs incorporating Hf0.5Zr0.5O2 as the gate dielectric on mica substrates, which offer high surface flatness, low defect density, and superior mechanical durability. The fabricated devices exhibit outstanding electrical characteristics, including a field-effect mobility of 38.4 cm2/V·s, a subthreshold swing of 93 mV/dec, and a transconductance of 14.2 μS. These results demonstrate the excellent mechanical stability and reliable electrical performance of the proposed devices under bending stress, highlighting their suitability for mechanically demanding flexible electronics applications.
Source: Nanomaterials
DOI: 10.3390/nano15161218
Institution: Guilin University of Electronic Technology
Language: English
Subfield: Materials Chemistry
Field: Materials Science
Domain: Physical Sciences
Open Access status: gold
Estimated APC paid: $2,896
Awards: G6476984883, G6895473284
OpenAlex ID: W4413207576
