Work

Localized Anodic Etching Rates of III–V Semiconductors through Scanning Electrochemical Probe Lithography

Year: 2025

Type: article

Source: The Journal of Physical Chemistry C

DOI: 10.1021/acs.jpcc.5c03268

Authors: Jianan Huang, Yiqing Huang, Hantao Xu, Yao Liu, Jian-Jia Su, Dongping Zhan, Lianhuan Han

Institution: Xiamen University

Language: English

Topic: Nanofabrication and Lithography Techniques

Subfield: Biomedical Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funders: National Natural Science Foundation of China, Fundamental Research Funds for the Central Universities

Awards: G4008174109, G7327409615, G7519205726, G8982936812

OpenAlex ID: W4413232139

FWCI: 0.723

Cites: 30

Cited by: 3

Related to: 10