Work

Pulsed Laser Annealing of Deposited Amorphous Carbon Films

Year: 2025

Type: article

Abstract: Pulsed laser annealing (PLA) was performed on a 0.3 μm thick hydrogenated amorphous carbon (a-C:H) film deposited on silicon substrate by plasma-enhanced chemical vapor deposition (PECVD). The 532 nm, 32 ns PLA ranged in fluence from 0.2 to 0.94 J cm−2. There were no visible signs of film delamination over the entire fluence range for a single pulse. As the fluence increased, graphitization of the amorphous film bulk was observed. However, at the near surface of the film, there was a concomitant increase in sp3 content. The sp3 bonding observed is the result of the formation of a thin diamond-like layer on the surface of the carbon film. Along with increasing laser fluence, the film swelled by 75% up to 0.6 J cm−2. In addition, carbon fiber formation was observed at 0.6 J cm−2, increasing in size and depth up through 0.94 J cm−2. The origin of this transformation may be associated with a rapid outgassing of hydrogen from the amorphous carbon during the PLA step. Additionally, there was a dramatic increase in the visible light absorption of these thin films with increasing laser fluence, despite the films being less than a micron thick. These results suggest that PLA of a-C:H film is a useful method for modifying the surface structure for optical or electrochemical applications without film ablation.

Source: C – Journal of Carbon Research

DOI: 10.3390/c11030060