Work

Optimization of process pressure for reactive electron beam evaporation of the HfO2 thin film for electro-optical applications

Year: 2025

Type: article

Source: Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

DOI: 10.1116/6.0004709

Authors: Mustafa Burak Cosar, Kaan Demiralay

Institution: Aselsan (Turkey)

Language: English

Topic: Optical Coatings and Gratings

Subfield: Surfaces, Coatings and Films

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4413248369

FWCI: 0.209

Cites: 27

Cited by: 1

Related to: 10