Work

Optimization and Impact of Gate Stack on 22 nm Triple Gate FinFET Architecture for Enhanced Electrical Performance

Year: 2025

Type: conference-paper

DOI: 10.1109/mpseciceta64837.2025.11118671

Authors: Varun Mishra, Chandni Tiwari, Neha Belwal, Manan Sharma, Mohd. Umer Ansari, Vikas Rathi

Institutions: Madhav Institute of Technology & Science, Graphic Era University

Language: English

Topic: Advancements in Semiconductor Devices and Circuit Design

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4413319946

FWCI:

Cites: 8

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Related to: 10