Work

Effect of External Electric Field on Co Chemical Mechanical Polishing: A Reactive Molecular Dynamics Study

Year: 2025

Type: article

Source: Langmuir

DOI: 10.1021/acs.langmuir.5c02812

Authors: Cheng Huang, Min Zhong, Wenhu Xu, Meirong Yi, Xiaobing Li, Jianfeng Chen

Institution: Nanchang University

Language: English

Topic: Advanced Surface Polishing Techniques

Subfield: Biomedical Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: National Natural Science Foundation of China

Awards: 超声弯曲振动辅助化学机械抛光原子级光滑蓝宝石衬底机理研究, G8777144741

OpenAlex ID: W4413356520

FWCI: 0.723

Cites: 45

Cited by: 3

Related to: 10