Work

Role of Precursor Miscibility in Area‐Selective Atomic Layer Deposition

Year: 2025

Type: article

Source: Advanced Materials

DOI: 10.1002/adma.202506699

Authors: Alexander Shearer, Yukio Cho, Andreas Werbrouck, Amnon Rothman, Tzu‐Ling Liu, Stacey F Bent

Institutions: Stanford University, SLAC National Accelerator Laboratory

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funders: National Science Foundation, Stanford Precourt Institute for Energy, Japan Society for the Promotion of Science

Award: NNCI: nano@stanford

OpenAlex ID: W4413361472

FWCI: 1.138

Cites: 46

Cited by: 5

Related to: 10