Work

OPC and modeling solution to support 0.55 NA EUV stitching

Year: 2025

Type: article

Source: Journal of Micro/Nanopatterning Materials and Metrology

DOI: 10.1117/1.jmm.24.4.041203

Authors: Dongbo Xu, Qinglin Zeng, Xuefeng Zeng, Werner Gillijns, Vicky Philipsen, Kalaivanan Loganathan, Shubhankar Das, Kia Woon Mah, Victor Blanco, Anuja De Silva, Yuyang Sun, Germain Fenger

Institutions: Siemens (Germany), IMEC, Imec the Netherlands, Lam Research (United States)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: European Commission

Award: 10 Angstrom CMOS exploration

OpenAlex ID: W4413425723

FWCI: 0.225

Cites:

Cited by: 1

Related to: 10