Year: 2025
Type: article
Abstract: Residual stress in optical thin films severely degrades optoelectronic device performance. Traditional designs, relying on extensive experiments, limit precise stress regulation. This study proposes a Stoney’s formula-based stress design method for multilayer thin films, constructing a mathematical model to characterize their total stress. Innovatively, it integrates single-layer stress and spectral performance for dual-objective optimization (stress elimination and spectral indicators), significantly reducing deposition workload. Experiments show small stress-prediction deviations in the 1.064 μm laser and 3.7–4.8 μm mid-infrared bands. A 16-layer broadband antireflection film (400–900 nm) with Ti2O3, HfO2, and SiO2 also shows effectively reduced stress. This model offers a novel, reliable scheme for precise residual stress regulation in multilayer thin films.
Source: Coatings
Language: English
Subfield: Surfaces, Coatings and Films
Field: Materials Science
Domain: Physical Sciences
Open Access status: gold
Estimated APC paid: $3,137
OpenAlex ID: W4413430476