Work

Nanosecond IR Laser-Assisted Selective 3D Etching of Silicon for Photovoltaics

Year: 2025

Type: conference-paper

Abstract: Selective etching of laser-modified silicon (Si) enables 3D micro-sculpturing, offering new opportunities for photovoltaic (PV) applications. This technique facilitates high-aspect-ratio microstructures for light trapping in solar cells, photon management in photodetectors, and MEMS fabrication. We optimize selective wet-chemical etching of crystalline silicon (c-Si) modified by an infrared (IR) nanosecond (ns) laser, achieving high selectivity and controlled etching rates [1]. Additionally, we ensure complete removal of defected regions, producing a smooth, damage-free surface, crucial for PV applications requiring long carrier lifetimes.

DOI: 10.1109/cleo/europe-eqec65582.2025.11110232

Authors: Darya Akhtaryarazar, Viktor Kadan, Khalil Dadashi, Kardelen Demirbas, Alpan Bek, Mona Zolfaghari Borra, Bülent Arikan, Arian Goodarzi, Rasit Turan, Ihor Pavlov

Institution: Middle East Technical University

Language: English

Topic: Laser Material Processing Techniques

Subfield: Computational Mechanics

Field: Engineering

Domain: Physical Sciences

SDG: Affordable and clean energy

Open Access status: green

OpenAlex ID: W4413456409

FWCI:

Cites: 1

Cited by:

Related to: 10