Work

Ptychographic Imaging Ellipsometry with Visible and Extreme Ultraviolet Light

Year: 2025

Type: conference-paper

DOI: 10.1109/cleo/europe-eqec65582.2025.11110555

Authors: Matthias Gouder, Fengling Zhang, Mengqi Du, Stefan Witte

Institution: Advanced Research Center for Nanolithography (Netherlands)

Language: English

Topic: Advanced X-ray Imaging Techniques

Subfield: Radiation

Field: Physics and Astronomy

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4413457902

FWCI:

Cites: 4

Cited by:

Related to: 10