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A fast mask three-dimensional model based on multidirectional filtering

Year: 2025

Type: conference-paper

Source: International Conference on Optics and Machine Vision (ICOMV)

DOI: 10.1117/12.3071834

Authors: Sheng Liu, Xu Ma

Institution: Beijing Institute of Technology

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4413466016

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