Work

High-rate deposition of dense and uniform SiGe thick films via nanocluster-assembled mesoplasma spray chemical vapor deposition

Year: 2025

Type: article

Source: Applied Surface Science

DOI: 10.1016/j.apsusc.2025.165603

Authors: Wen-Bo Wang, Kang Li, Ken Chen, Wenfang Li, Jun Du, Ryoshi Ohta, Makoto Kambara

Institutions: Dongguan University of Technology, South China University of Technology, The University of Tokyo, The University of Osaka

Language: English

Topic: Advanced Materials and Semiconductor Technologies

Subfield: Materials Chemistry

Field: Materials Science

Domain: Physical Sciences

Open Access status: green

Funders: New Energy and Industrial Technology Development Organization, Ministry of Economy, Trade and Industry, National Key Laboratory Foundation of China, Guangdong Province Introduction of Innovative R&D Team, Agency for Natural Resources and Energy, National Key Research and Development Program of China

Awards: G1788742559, G3503178383, G8990675908

OpenAlex ID: W7115895451

FWCI:

Cites: 76

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Related to: 10