Work

Robust low-temperature ferroelectric behavior of Al0.75Sc0.25N films

Year: 2025

Type: article

Source: Applied Physics Letters

DOI: 10.1063/5.0273865

Authors: Dan Li, Mingrui Liu, Shuai Wang, Yuping Jia, Ke Jiang, Hang Zang, Rui Sun, Xiaojuan Sun, Dabing Li

Institutions: Chinese Academy of Sciences, Changchun Institute of Optics, Fine Mechanics and Physics, University of Chinese Academy of Sciences

Language: English

Topic: Ferroelectric and Negative Capacitance Devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funders: National Natural Science Foundation of China, National Key Research and Development Program of China

Awards: G2738227174, G5063899986, G5380092605, G762520077

OpenAlex ID: W4413518820

FWCI: 0.227

Cites: 47

Cited by: 1

Related to: 10