Research progress on mask optimization technology at advanced technology nodes
Year: 2025
Type: article
Source: Scientia Sinica Technologica
Authors: Yihua ZHU, Dandan HAN, Sen DENG, Yayi WEI
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W4413537335