Work

Uniform Al0.87Sc0.13N Thin Film Deposition at Wafer Scale through Magnetron Sputtering

Year: 2025

Type: article

Source: Crystal Growth & Design

DOI: 10.1021/acs.cgd.5c00401

Authors: Mei Wang, Xinhang Wang, Jun Gao, Zhengwang Cheng, Shengjia Li, Wendou Ding, Aobo Wang, Huating Bo, Zhenghao Guo, Wei Zou, Minghu Pan, Xinguo Ma

Institutions: Hubei University of Technology, Shaanxi Normal University

Language: English

Topic: Ferroelectric and Negative Capacitance Devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funders: Hubei University of Technology, National College Students Innovation and Entrepreneurship Training Program

Awards: G1985937236, G6871147469, G8850311661

OpenAlex ID: W4413810285

FWCI: 0.228

Cites: 42

Cited by: 1

Related to: 10